Publication:

Cryogenic etching of porous organosilicate low-k materials: fluorine based plasma analysis

Date

2015
Meeting abstract
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dc.contributor.authorLeroy, F
dc.contributor.authorTillocher, T
dc.contributor.authorZhang, Liping
dc.contributor.authorGirard, A.
dc.contributor.authorCardinaud, C.
dc.contributor.authorLefaucheux, P.
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorDussart, R.
dc.contributor.authorMaekawa, K
dc.contributor.authorYatsuda, K
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.date.accessioned2021-10-22T20:26:45Z
dc.date.available2021-10-22T20:26:45Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25532
dc.identifier.urlhttp://pesm-conference.org/files/2015_abstractbook.pdf
dc.source.beginpagen/a
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate27/04/2015
dc.source.conferencelocationLeuven Belgium
dc.title

Cryogenic etching of porous organosilicate low-k materials: fluorine based plasma analysis

dc.typeMeeting abstract
dspace.entity.typePublication
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