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Silicide yield improvement with NiPtSi formation by laser anneal for advanced low power platform CMOS technology
Publication:
Silicide yield improvement with NiPtSi formation by laser anneal for advanced low power platform CMOS technology
Date
2009
Proceedings Paper
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18888.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ortolland, Claude
;
Rosseel, Erik
;
Horiguchi, Naoto
;
Kerner, Christoph
;
Mertens, Sofie
;
Kittl, Jorge
;
Verleysen, Eveline
;
Bender, Hugo
;
Vandervorst, Wilfried
;
Lauwers, Anne
;
Absil, Philippe
;
Biesemans, Serge
;
Mathukrishnan, S.
;
Srinivasan, S.
;
Mayur, A.J.
;
Schreutelkamp, Rob
;
Hoffmann, Thomas Y.
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since deposited on 2021-10-18
Acq. date: 2025-10-23
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1847
since deposited on 2021-10-18
Acq. date: 2025-10-23
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Downloads
1
since deposited on 2021-10-18
Acq. date: 2025-10-23
Views
1847
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations