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An experimental study of VUV plasma damage on porous organo-silicon glass materials

Date

2013-02
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dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorLukaszewicz, Mikolaj
dc.contributor.authorHeyne, Markus
dc.contributor.authorZhang, Liping
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorZhang, Liping
dc.date.accessioned2021-10-21T07:09:17Z
dc.date.available2021-10-21T07:09:17Z
dc.date.issued2013-02
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22210
dc.source.conferenceSPIE Advanced Lithography Conference: Advanced Etch Technology for Nanopatterning II
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Francisco, CA USA
dc.title

An experimental study of VUV plasma damage on porous organo-silicon glass materials

dc.typeMeeting abstract
dspace.entity.typePublication
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