Publication:

Ultralow resistive wrap around contact to scaled FinFET devices by using ALD-Ti contact metal

Date

2017
Proceedings Paper
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Author(s)

Chew, Soon Aik
;
Yu, Hao  
;
Schaekers, Marc  
;
Demuynck, Steven  
;
Mannaert, Geert  
;
Kunnen, Eddy
;
Rosseel, Erik  
;
Hikavyy, Andriy  
;
Dangol, Anish  
;
De Meyer, Kristin  
;
Mocuta, Dan
;
Horiguchi, Naoto  
;
Leusink, Gert
;
Wajda, Cory
;
Hakamata, T
;
Hasegawa, T
;
Tapily, K
;
Clark, R

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