Publication:

Chemisorption of ALD precursors in and on porous low-k films

Date

2013
Journal article
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dc.contributor.authorVerdonck, Patrick
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSwerts, Johan
dc.contributor.authorFarrell, Leo
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorTielens, Hilde
dc.contributor.authorVan Besien, Els
dc.contributor.authorWitters, Thomas
dc.contributor.authorNyns, Laura
dc.contributor.authorVan Elshocht, Sven
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorVan Besien, Els
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-21T14:01:40Z
dc.date.available2021-10-21T14:01:40Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23324
dc.source.beginpage81
dc.source.endpage84
dc.source.journalMicroelectronic Engineering
dc.source.volume106
dc.title

Chemisorption of ALD precursors in and on porous low-k films

dc.typeJournal article
dspace.entity.typePublication
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