Publication:
Alkaline cleaning of silicon wafers: additives for the prevention of metal contamination
Date
| dc.contributor.author | Martin Hoyas, Ana | |
| dc.contributor.author | Baeyens, Martien | |
| dc.contributor.author | Hub, W. | |
| dc.contributor.author | Mertens, Paul | |
| dc.contributor.author | Kolbesen, B. O. | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.date.accessioned | 2021-10-14T11:30:10Z | |
| dc.date.available | 2021-10-14T11:30:10Z | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3655 | |
| dc.source.beginpage | 197 | |
| dc.source.endpage | 208 | |
| dc.source.issue | 2_3 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.volume | 45 | |
| dc.title | Alkaline cleaning of silicon wafers: additives for the prevention of metal contamination | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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