Publication:
Dry-etch fin patterning of a sub-22nm node SRAM cell: EUV lithography new dry etch challenges
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1890 since deposited on 2021-10-19
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Acq. date: 2026-04-06
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1890 since deposited on 2021-10-19
1last month
1last week
Acq. date: 2026-04-06
Citations