Publication:
Dry-etch fin patterning of a sub-22nm node SRAM cell: EUV lithography new dry etch challenges
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1894 since deposited on 2021-10-19
3last month
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Acq. date: 2026-08-09
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Statistics
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1894 since deposited on 2021-10-19
3last month
1last week
Acq. date: 2026-08-09
Citations