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Titanium silicide on Si:P with precontact amorphization implantation treatment: contact resistivity approaching 1×10-9 Ohm-cm²
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Titanium silicide on Si:P with precontact amorphization implantation treatment: contact resistivity approaching 1×10-9 Ohm-cm²
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Date
2016
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34160.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Yu, Hao
;
Schaekers, Marc
;
Peter, Antony
;
Pourtois, Geoffrey
;
Rosseel, Erik
;
Lee, Joon-Gon
;
Song, Woo-Bin
;
Shin, Keo Myoung
;
Everaert, Jean-Luc
;
Chew, Soon Aik
;
Demuynck, Steven
;
Kim, Daeyong
;
Barla, Kathy
;
Mocuta, Anda
;
Horiguchi, Naoto
;
Thean, Aaron
;
Collaert, Nadine
;
De Meyer, Kristin
Journal
IEEE Transactions on Electron Devices
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since deposited on 2021-10-23
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1
since deposited on 2021-10-23
Acq. date: 2025-12-10
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1990
since deposited on 2021-10-23
1
last month
Acq. date: 2025-12-10
Citations