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Thickness dependence and annealing behavior of Pt-group metal thin films as alternative metals for advanced interconnects

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dc.contributor.authorDutta, Shibesh
dc.contributor.authorOpsomer, Karl
dc.contributor.authorHoque, Anamul
dc.contributor.authorPeeters, Kristof
dc.contributor.authorRichard, Olivier
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorTokei, Zsolt
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorAdelmann, Christoph
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.date.accessioned2021-10-23T10:42:47Z
dc.date.available2021-10-23T10:42:47Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26588
dc.source.beginpage149
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM 2016
dc.source.conferencedate20/03/2016
dc.source.conferencelocationBrussels Belgium
dc.source.endpage150
dc.title

Thickness dependence and annealing behavior of Pt-group metal thin films as alternative metals for advanced interconnects

dc.typeMeeting abstract
dspace.entity.typePublication
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