Publication:

Co-silicide, Co(Ni)-silicide and Ni-silicide to source/drain contact resistance

Date

2003
Proceedings Paper
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dc.contributor.authorAkheyar, Amal
dc.contributor.authorLauwers, Anne
dc.contributor.authorKittl, Jorge
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorChamirian, Oxana
dc.contributor.authorJonckheere, Rik
dc.contributor.authorLeunissen, Peter
dc.contributor.authorVan Dal, Mark
dc.contributor.authorLindsay, Richard
dc.contributor.authorTempel, Georg
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-10-15T03:58:41Z
dc.date.available2021-10-15T03:58:41Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7127
dc.source.beginpage197
dc.source.conferenceAdvanced Short-Time Thermal Processing for Si-based CMOS devices
dc.source.conferencedate27/04/2003
dc.source.conferencelocationParis France
dc.source.endpage204
dc.title

Co-silicide, Co(Ni)-silicide and Ni-silicide to source/drain contact resistance

dc.typeProceedings paper
dspace.entity.typePublication
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