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Hydrogen passivation of HF last cleaned (100) silicon surfaces investigated by multiple internal reflection infrared spectroscopy

Date

1994
Journal article
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dc.contributor.authorBender, Hugo
dc.contributor.authorVerhaverbeke, Steven
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorHeyns, Marc
dc.date.accessioned2021-09-29T12:39:48Z
dc.date.available2021-09-29T12:39:48Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40
dc.source.beginpage3128
dc.source.endpage3136
dc.source.issue11
dc.source.journalJournal of the Electrochemical Society
dc.source.volume141
dc.title

Hydrogen passivation of HF last cleaned (100) silicon surfaces investigated by multiple internal reflection infrared spectroscopy

dc.typeJournal article
dspace.entity.typePublication
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