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Analysis of diffusion mechanisms for SSD in confined volumes : An alternative solution for extension formation in N7 and N5 technologies

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dc.contributor.authorEyben, Pierre
dc.contributor.authorPawlak, Bartek
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorKikuchi, Yoshiaki
dc.contributor.authorMitard, Jerome
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorMocuta, Dan
dc.contributor.authorMocuta, Anda
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorKikuchi, Yoshiaki
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-25T18:33:06Z
dc.date.available2021-10-25T18:33:06Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30690
dc.source.beginpageI.15.5
dc.source.conferenceE-MRS Spring Symposium I: Materials Research for Group IV Semiconductors: Growth, Characterization and Technological Development
dc.source.conferencedate18/06/2018
dc.source.conferencelocationStrasbourg France
dc.title

Analysis of diffusion mechanisms for SSD in confined volumes : An alternative solution for extension formation in N7 and N5 technologies

dc.typeMeeting abstract
dspace.entity.typePublication
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