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On the effects of a pressure iInduced amorphous silicon layer on consecutive spreading resistance microscopy scans of doped silicon
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On the effects of a pressure iInduced amorphous silicon layer on consecutive spreading resistance microscopy scans of doped silicon
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Date
2015
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Coq Germanicus, Rosine
;
Leclère, Philippe
;
Guhel, Y.
;
Boudart, B.
;
Touboul, A. D.
;
Descamps, P.
;
Hug, E.
;
Eyben, Pierre
Journal
Journal of Applied Physics
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Acq. date: 2025-12-11
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1920
since deposited on 2021-10-22
Acq. date: 2025-12-11
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Downloads
1
since deposited on 2021-10-22
Acq. date: 2025-12-11
Views
1920
since deposited on 2021-10-22
Acq. date: 2025-12-11
Citations