Novel processing technologies for advanced EUV patterning materials using metal oxide resist (MOR)

dc.contributor.author	Onitsuka, Tomoya
dc.contributor.author	Kawakami, Shinichiro
dc.contributor.author	Dauendorffer, Arnaud
dc.contributor.author	Shimura, Satoru
dc.contributor.author	Nafus, Kathleen
dc.contributor.author	Feurprier, Yannick
dc.contributor.author	Foubert, Philippe
dc.contributor.author	De Simone, Danilo
dc.contributor.imecauthor	Foubert, Philippe
dc.contributor.imecauthor	De Simone, Danilo
dc.contributor.orcidimec	De Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned	2023-01-17T08:12:40Z
dc.date.available	2021-11-02T15:58:32Z
dc.date.available	2023-01-17T08:12:40Z
dc.date.issued	2021
dc.identifier.doi	10.1117/12.2583809
dc.identifier.eisbn	978-1-5106-4052-8
dc.identifier.isbn	978-1-5106-4051-1
dc.identifier.issn	0277-786X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/37692
dc.publisher	SPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage	116091L
dc.source.conference	Conference on Extreme Ultraviolet (EUV) Lithography XII
dc.source.conferencedate	FEB 22-26, 2021
dc.source.conferencelocation	Virtual
dc.source.journal	Proceedings of SPIE
dc.source.numberofpages	7
dc.source.volume	11609
dc.title	Novel processing technologies for advanced EUV patterning materials using metal oxide resist (MOR)
dc.type	Proceedings paper
dspace.entity.type	Publication
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