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High depth resolution depth profile analysis of ultra thin high-k Hf based films using MEIS compared with XTEM, XRF, SE and XPS

Date

2009
Proceedings Paper
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dc.contributor.authorvan den Berg, J.A.
dc.contributor.authorReading, M. A.
dc.contributor.authorParisini, A.
dc.contributor.authorKolbe, M.
dc.contributor.authorBeckhoff, B.
dc.contributor.authorLadas, S.
dc.contributor.authorFried, M.
dc.contributor.authorPetrik, P.
dc.contributor.authorBailey, P.
dc.contributor.authorNoakes, T.
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-18T03:59:06Z
dc.date.available2021-10-18T03:59:06Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16361
dc.source.beginpage349
dc.source.conferenceAnalytical Techniques for Semiconductor Materials and Process Characterization 6
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.source.endpage361
dc.title

High depth resolution depth profile analysis of ultra thin high-k Hf based films using MEIS compared with XTEM, XRF, SE and XPS

dc.typeProceedings paper
dspace.entity.typePublication
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