Publication:
Characterization of AlCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy
Date
| dc.contributor.author | Nohira, Hiroshi | |
| dc.contributor.author | Tsai, Wilman | |
| dc.contributor.author | Besling, Wim | |
| dc.contributor.author | Young, Edward | |
| dc.contributor.author | Pétry, Jasmine | |
| dc.contributor.author | Conard, Thierry | |
| dc.contributor.author | Vandervorst, Wilfried | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.author | Heyns, Marc | |
| dc.contributor.author | Maes, Jos | |
| dc.contributor.author | Tuominen, Marko | |
| dc.contributor.imecauthor | Conard, Thierry | |
| dc.contributor.imecauthor | Vandervorst, Wilfried | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.imecauthor | Heyns, Marc | |
| dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.date.accessioned | 2021-10-14T17:27:15Z | |
| dc.date.available | 2021-10-14T17:27:15Z | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5521 | |
| dc.source.conference | Symposium Q of the E-MRS Spring Meeting 2001: High-k Gate Dielectrics; June 5-8, 2001; Strasbourg, France. | |
| dc.source.conferencelocation | ||
| dc.title | Characterization of AlCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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