Publication:
Progressive degradation of TiN/SiON and TiN'/HfO2 gate stack triple gate SOI nFinFETs subjected to electrical stress
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1928 since deposited on 2021-10-18
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Acq. date: 2026-01-10
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Views
1928 since deposited on 2021-10-18
1last month
1last week
Acq. date: 2026-01-10
Citations