Progressive degradation of TiN/SiON and TiN'/HfO2 gate stack triple gate SOI nFinFETs subjected to electrical stress

dc.contributor.author	Rafi, J.M.
dc.contributor.author	Simoen, Eddy
dc.contributor.author	Mercha, Abdelkarim
dc.contributor.author	Collaert, Nadine
dc.contributor.author	Campabadal, F.
dc.contributor.author	Claeys, Cor
dc.contributor.imecauthor	Simoen, Eddy
dc.contributor.imecauthor	Mercha, Abdelkarim
dc.contributor.imecauthor	Collaert, Nadine
dc.contributor.orcidimec	Simoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimec	Mercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimec	Collaert, Nadine::0000-0002-8062-3165
dc.date.accessioned	2021-10-18T02:04:13Z
dc.date.available	2021-10-18T02:04:13Z
dc.date.embargo	9999-12-31
dc.date.issued	2009
dc.identifier.issn	1071-1023
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/16075
dc.source.beginpage	453
dc.source.endpage	458
dc.source.issue	1
dc.source.journal	Journal of Vacuum Science and Technology B
dc.source.volume	27
dc.title	Progressive degradation of TiN/SiON and TiN'/HfO2 gate stack triple gate SOI nFinFETs subjected to electrical stress
dc.type	Journal article
dspace.entity.type	Publication
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