Publication:
Low-Voltage Aberration-Corrected SEM Metrology of Thin Resist for High-NA EUVL
| dc.contributor.author | Zidan, Mohamed | |
| dc.contributor.author | Fischer, Daniel | |
| dc.contributor.author | Lorusso, Gian | |
| dc.contributor.author | Severi, Joren | |
| dc.contributor.author | De Simone, Danilo | |
| dc.contributor.author | Moussa, Alain | |
| dc.contributor.author | Muellender, Angelika | |
| dc.contributor.author | Mack, Chris A. | |
| dc.contributor.author | Charley, Anne-Laure | |
| dc.contributor.author | Leray, Philippe | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.imecauthor | Zidan, Mohamed | |
| dc.contributor.imecauthor | Lorusso, Gian | |
| dc.contributor.imecauthor | Severi, Joren | |
| dc.contributor.imecauthor | De Simone, Danilo | |
| dc.contributor.imecauthor | Moussa, Alain | |
| dc.contributor.imecauthor | Charley, Anne-Laure | |
| dc.contributor.imecauthor | Leray, Philippe | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
| dc.contributor.orcidimec | Charley, Anne-Laure::0000-0003-4745-0167 | |
| dc.contributor.orcidimec | Leray, Philippe::0000-0002-1086-270X | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.contributor.orcidimec | Moussa, Alain::0000-0002-6377-4199 | |
| dc.contributor.orcidimec | Lorusso, Gian::0000-0003-3498-5082 | |
| dc.date.accessioned | 2022-12-19T09:56:54Z | |
| dc.date.available | 2022-09-08T02:38:57Z | |
| dc.date.available | 2022-12-19T09:56:54Z | |
| dc.date.issued | 2022 | |
| dc.description.wosFundingText | This work was executed as part of imec's core partner program. Joren Severi received funding from FWO (1SA8919N). | |
| dc.identifier.doi | 10.1117/12.2613990 | |
| dc.identifier.eisbn | 978-1-5106-4982-8 | |
| dc.identifier.isbn | 978-1-5106-4981-1 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40376 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 120530P | |
| dc.source.conference | Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference | |
| dc.source.conferencedate | FEB 24-MAY 27, 2022 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 12 | |
| dc.source.volume | 12053 | |
| dc.title | Low-Voltage Aberration-Corrected SEM Metrology of Thin Resist for High-NA EUVL | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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