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Schottky barrier height lowering by an increase of the substrate doping in PtSi Schottky barrier source/drain FETs

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dc.contributor.authorLousberg, Gregory
dc.contributor.authorYu, HongYu
dc.contributor.authorFroment, Benoit
dc.contributor.authorAugendre, Emmanuel
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorLauwers, Anne
dc.contributor.authorLi, M.F.
dc.contributor.authorAbsil, Philippe
dc.contributor.authorJurczak, Gosia
dc.contributor.authorBiesemans, Serge
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.date.accessioned2021-10-16T17:39:35Z
dc.date.available2021-10-16T17:39:35Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12517
dc.source.beginpage123
dc.source.endpage125
dc.source.issue2
dc.source.journalIEEE Electron Device Letters
dc.source.volume28
dc.title

Schottky barrier height lowering by an increase of the substrate doping in PtSi Schottky barrier source/drain FETs

dc.typeJournal article
dspace.entity.typePublication
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