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Feasibility of 250 nm gate patterning using i-line with OPC
Publication:
Feasibility of 250 nm gate patterning using i-line with OPC
Date
1998
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Driessche, Veerle
;
Finders, Jo
;
Tritchkov, Alexander
;
Ronse, Kurt
;
Van den hove, Luc
;
Tzviatkov, Plamen
Journal
Microelectronic Engineering
Abstract
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1962
since deposited on 2021-10-01
Acq. date: 2025-10-23
Citations
Metrics
Views
1962
since deposited on 2021-10-01
Acq. date: 2025-10-23
Citations