Publication:
The impact of backside particles on the limits of optical lithography
Date
| dc.contributor.author | Bearda, Twan | |
| dc.contributor.author | Mertens, Paul | |
| dc.contributor.author | Holsteyns, Frank | |
| dc.contributor.author | De Bisschop, Peter | |
| dc.contributor.author | Compen, R. | |
| dc.contributor.author | van Meer, R. | |
| dc.contributor.author | Heyns, Marc | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.contributor.imecauthor | Holsteyns, Frank | |
| dc.contributor.imecauthor | De Bisschop, Peter | |
| dc.contributor.imecauthor | Heyns, Marc | |
| dc.date.accessioned | 2021-10-15T12:41:30Z | |
| dc.date.available | 2021-10-15T12:41:30Z | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8547 | |
| dc.source.conference | 7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS | |
| dc.source.conferencedate | 20/09/2004 | |
| dc.source.conferencelocation | Brussel Belgium | |
| dc.title | The impact of backside particles on the limits of optical lithography | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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