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Update on main chain scission resists in Zeon for high-NA EUV lithography

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dc.contributor.authorShirotori, Akihide
dc.contributor.authorOda, Yuji
dc.contributor.authorTaguchi, Kazunori
dc.contributor.authorYeh, Sin Fu
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorSanuki, Hideaki
dc.contributor.imecauthorYeh, Sin Fu
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorAkihide, Shirotori
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecSuh, Hyo Seon::0000-0003-4370-5062
dc.contributor.orcidimecVandenberghe, Geert::0009-0001-2424-1322
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2024-03-04T14:25:50Z
dc.date.available2024-01-13T17:47:51Z
dc.date.available2024-03-04T14:25:50Z
dc.date.issued2023
dc.identifier.doi10.1117/12.2686602
dc.identifier.eisbn978-1-5106-6749-5
dc.identifier.isbn978-1-5106-6748-8
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43410
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateOCT 02-05, 2023
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.numberofpages9
dc.title

Update on main chain scission resists in Zeon for high-NA EUV lithography

dc.typeProceedings paper
dspace.entity.typePublication
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