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New bending mode in SAQP Si fins and its mitigation

 
dc.contributor.authorSepulveda Marquez, Alfonso
dc.contributor.authorHellin, David
dc.contributor.authorZhang, Liping
dc.contributor.authorKenis, Karine
dc.contributor.authorBatuk, Dmitry
dc.contributor.authorBaudot, Sylvain
dc.contributor.authorBriggs, Basoene
dc.contributor.authorMountsier, Tom
dc.contributor.authorBarla, Kathy
dc.contributor.authorMorin, Pierre
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.imecauthorSepulveda Marquez, Alfonso
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorBatuk, Dmitry
dc.contributor.imecauthorBaudot, Sylvain
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorBarla, Kathy
dc.contributor.imecauthorMorin, Pierre
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.orcidimecZhang, Liping::0000-0002-2947-8660
dc.contributor.orcidimecSanchez, Efrain Altamirano::0000-0003-3235-6055
dc.contributor.orcidimecBatuk, Dmitry::0000-0002-6384-6690
dc.contributor.orcidimecMorin, Pierre::0000-0002-4637-496X
dc.contributor.orcidimecSepulveda Marquez, Alfonso::0000-0003-4726-177X
dc.contributor.orcidimecAltamirano Sanchez, Efrain::0000-0003-3235-6055
dc.contributor.orcidimecKenis, Karine::0000-0001-7116-7498
dc.date.accessioned2023-06-20T13:57:09Z
dc.date.available2023-06-20T10:34:30Z
dc.date.available2023-06-20T13:57:09Z
dc.date.issued2022
dc.description.wosFundingTextThe authors would like to acknowledge the Logic Program of imec, the Materials and Components Analysis team (MCA) , the SEM/TEMteam and Arenberg 300 mm pilot line for their support. P.M. is deeply grateful to Dr. Shay Reboh from CEA Leti for former collaboration and discussion on mechanical modelling, applied here to establish equation (5) .
dc.identifier.doi10.1016/j.mssp.2021.106437
dc.identifier.issn1369-8001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41852
dc.publisherELSEVIER SCI LTD
dc.source.beginpageArt. 106437
dc.source.endpagena
dc.source.issueApril
dc.source.journalMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
dc.source.numberofpages8
dc.source.volume141
dc.title

New bending mode in SAQP Si fins and its mitigation

dc.typeJournal article
dspace.entity.typePublication
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