Publication:

Application of electron channeling contrast imaging to 3D semiconductor structures through proper detector configurations

Date

2020
Journal article
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dc.contributor.authorHan, Han
dc.contributor.authorHantschel, Thomas
dc.contributor.authorStrakos, Libor
dc.contributor.authorVystavel, Tomas
dc.contributor.authorBaryshnikova, Marina
dc.contributor.authorMols, Yves
dc.contributor.authorKunert, Bernardette
dc.contributor.authorLanger, Robert
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorHan, Han
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorBaryshnikova, Marina
dc.contributor.imecauthorMols, Yves
dc.contributor.imecauthorKunert, Bernardette
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecHan, Han::0000-0003-2169-8332
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.contributor.orcidimecBaryshnikova, Marina::0000-0002-5945-4459
dc.contributor.orcidimecKunert, Bernardette::0000-0002-8986-4109
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.date.accessioned2021-10-28T22:21:25Z
dc.date.available2021-10-28T22:21:25Z
dc.date.issued2020
dc.identifier.issn0304-3991
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35239
dc.identifier.urlhttps://doi.org/10.1016/j.ultramic.2019.112928
dc.source.beginpage112928
dc.source.journalUltramicroscopy
dc.source.volume210
dc.title

Application of electron channeling contrast imaging to 3D semiconductor structures through proper detector configurations

dc.typeJournal article
dspace.entity.typePublication
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