Publication:

Mean free path of electrons in EUV photoresist in the energy range 20 to 450 eV

Date

2023
Proceedings Paper
https://doi.org/10.1117/12.2658310
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dc.contributor.authorFallica, Roberto
dc.contributor.authorMahne, Nicola
dc.contributor.authorConard, Thierry
dc.contributor.authorVanleenhove, Anja
dc.contributor.authorNannarone, Stefano
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVanleenhove, Anja
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVanleenhove, Anja::0000-0001-5481-9642
dc.date.accessioned2024-04-15T08:41:34Z
dc.date.available2024-04-15T08:41:34Z
dc.date.embargo2023-03-31
dc.date.issued2023
dc.identifier.doi10.1117/12.2658310
dc.identifier.eisbn978-1-5106-6104-2
dc.identifier.isbn978-1-5106-6103-5
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43832
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 124980J
dc.source.conferenceConference on Advances in Patterning Materials and Processes XL
dc.source.conferencedateFEB 27-MAR 01, 2023
dc.source.conferencelocationSan Jose
dc.source.endpageN/A
dc.source.journalProceedings of SPIE
dc.source.numberofpages2
dc.source.volume12498
dc.title

Mean free path of electrons in EUV photoresist in the energy range 20 to 450 eV

dc.typeProceedings paper
dspace.entity.typePublication
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