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Achieving low VT Ni-FUSI CMOS via lanthanide incorporation in the gate stack
Publication:
Achieving low VT Ni-FUSI CMOS via lanthanide incorporation in the gate stack
Date
2007-09
Proceedings Paper
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14543.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Veloso, Anabela
;
Yu, HongYu
;
Lauwers, Anne
;
Chang, Shou-Zen
;
Adelmann, Christoph
;
Onsia, Bart
;
Demand, Marc
;
Brus, Stephan
;
Vrancken, Christa
;
Singanamalla, Raghunath
;
Lehnen, Peer
;
Kittl, Jorge
;
Kauerauf, Thomas
;
Vos, Rita
;
O'Sullivan, Barry
;
Van Elshocht, Sven
;
Mitsuhashi, Riichirou
;
Whittemore, G.
;
Yin, K.M.
;
Niwa, Masaaki
;
Hoffmann, Thomas
;
Absil, Philippe
;
Jurczak, Gosia
;
Biesemans, Serge
Journal
Abstract
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1989
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1989
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations