Publication:

Pattern fidelity verification for logic design in EUV lithography

Date

2014
Proceedings Paper
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dc.contributor.authorSugawara, Mino
dc.contributor.authorHendrickx, Eric
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorMaloney, Chris
dc.contributor.authorFenger, Germain
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2021-10-22T06:12:28Z
dc.date.available2021-10-22T06:12:28Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24571
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1863987
dc.source.beginpage90480V
dc.source.conferenceExtreme Ultraviolet (EUV) Llithography V
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.title

Pattern fidelity verification for logic design in EUV lithography

dc.typeProceedings paper
dspace.entity.typePublication
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