Publication:
Stress analysis with convergent beam electron diffraction around NMOS transistors
Date
| dc.contributor.author | Stuer, Cindy | |
| dc.contributor.author | Bender, Hugo | |
| dc.contributor.author | Van Landuyt, J. | |
| dc.contributor.author | Eyben, Pierre | |
| dc.contributor.imecauthor | Bender, Hugo | |
| dc.contributor.imecauthor | Eyben, Pierre | |
| dc.date.accessioned | 2021-10-14T17:55:14Z | |
| dc.date.available | 2021-10-14T17:55:14Z | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5686 | |
| dc.source.beginpage | 359 | |
| dc.source.conference | Proceedings 5th Multinational Conference on Electron Microscopy; 20-25 September 2001; Lecce, Italy. | |
| dc.source.conferencelocation | ||
| dc.source.endpage | 360 | |
| dc.title | Stress analysis with convergent beam electron diffraction around NMOS transistors | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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