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Impact of PDA temperature on electron trap energy and spatial distributions in SiO2/Al2O3 stack as the IPD in Flash memory cells
Publication:
Impact of PDA temperature on electron trap energy and spatial distributions in SiO2/Al2O3 stack as the IPD in Flash memory cells
Date
2009
Journal article
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19482.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zheng, X.F.
;
Zhang, W.D.
;
Govoreanu, Bogdan
;
Zhang, J.F.
;
Van Houdt, Jan
Journal
Microelectronic Engineering
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1852
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations
Metrics
Views
1852
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations