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Novel metal containing resists for EUV lithography extendibility
Publication:
Novel metal containing resists for EUV lithography extendibility
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Date
2016
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Simone, Danilo
;
Sayan, Safak
;
Dei, Satoshi
;
Pollentier, Ivan
;
Kuwahara, Yuhei
;
Vandenberghe, Geert
;
Nafus, Kathleen
;
Shiratani, Motohiro
;
Nakagawa, Hisashi
;
Naruoka, Takehiko
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Acq. date: 2025-12-11
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1940
since deposited on 2021-10-23
2
last month
Acq. date: 2025-12-11
Citations