Publication:

Novel metal containing resists for EUV lithography extendibility

Date

2016
Proceedings Paper
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dc.contributor.authorDe Simone, Danilo
dc.contributor.authorSayan, Safak
dc.contributor.authorDei, Satoshi
dc.contributor.authorPollentier, Ivan
dc.contributor.authorKuwahara, Yuhei
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorNafus, Kathleen
dc.contributor.authorShiratani, Motohiro
dc.contributor.authorNakagawa, Hisashi
dc.contributor.authorNaruoka, Takehiko
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorNaruoka, Takehiko
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-23T10:28:34Z
dc.date.available2021-10-23T10:28:34Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26513
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505770
dc.source.beginpage977606
dc.source.conferenceExtreme Ultravioelt (EUV) Lithography
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.title

Novel metal containing resists for EUV lithography extendibility

dc.typeProceedings paper
dspace.entity.typePublication
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