Influence of the substrate doping level on spreading resistance profiling

dc.contributor.author	Vandervorst, Wilfried
dc.contributor.author	Clarysse, Trudo
dc.contributor.author	Smith, H. E.
dc.contributor.imecauthor	Vandervorst, Wilfried
dc.date.accessioned	2021-09-29T15:43:14Z
dc.date.available	2021-09-29T15:43:14Z
dc.date.embargo	9999-12-31
dc.date.issued	1996
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/1602
dc.source.beginpage	404
dc.source.endpage	407
dc.source.issue	1
dc.source.journal	Journal of Vacuum Science and Technology B
dc.source.volume	14
dc.title	Influence of the substrate doping level on spreading resistance profiling
dc.type	Journal article
dspace.entity.type	Publication
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