Publication:
Light-matter interactions in photoresists for Extreme Ultraviolet Lithography. From conventional chemically amplified resists to alternative photoresists
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Acq. date: 2026-10-03
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1 since deposited on 2021-10-27
Acq. date: 2026-10-03
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2074 since deposited on 2021-10-27
6last month
2last week
Acq. date: 2026-10-02
Citations