Characterisation of HF-last cleaning of ion-implanted Si surfaces

dc.contributor.author	Kondoh, Eiichi
dc.contributor.author	Baklanov, Mikhaïl
dc.contributor.author	Jonckx, Franky
dc.contributor.author	Maex, Karen
dc.contributor.imecauthor	Maex, Karen
dc.date.accessioned	2021-09-30T12:22:30Z
dc.date.available	2021-09-30T12:22:30Z
dc.date.embargo	9999-12-31
dc.date.issued	1998
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/2675
dc.source.beginpage	107
dc.source.endpage	117
dc.source.issue	2
dc.source.journal	Materials Science in Semiconductor Processing
dc.source.volume	1
dc.title	Characterisation of HF-last cleaning of ion-implanted Si surfaces
dc.type	Journal article
dspace.entity.type	Publication
Files	Original bundle Name: 2564.pdf Size: 398.91 KB Format: Adobe Portable Document Format Download
Publication available in collections:	Articles

Date