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Cleaning of post-etch photoresist layer on patterned surface using organic solvent combined with physical forces
Publication:
Cleaning of post-etch photoresist layer on patterned surface using organic solvent combined with physical forces
Date
2007-04
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Le, Quoc Toan
;
Chiodarelli, Nicolo
;
Blum, Ivan
;
Kesters, Els
;
Lux, Marcel
;
Claes, Martine
;
Vereecke, Guy
;
Mertens, Paul
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1972
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-09
Citations
Metrics
Views
1972
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-09
Citations