Publication:

Predictive compact model for stress-induced on-product overlay correction

Date

2022
Journal article
https://doi.org/10.1117/1.JMM.21.4.043201
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dc.contributor.authorZhang, Huaichen
dc.contributor.authorTabery, Cyrus
dc.contributor.authorMaas, Ruben
dc.contributor.authorKhodko, Oleksandr
dc.contributor.authorBlanco, Victor
dc.contributor.authorCanga, Eren
dc.contributor.authorSchleicher, Filip
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorCanga, Eren
dc.contributor.imecauthorSchleicher, Filip
dc.contributor.orcidimecCanga, Eren::0000-0002-2322-8070
dc.contributor.orcidimecSchleicher, Filip::0000-0003-3630-7285
dc.contributor.orcidimecBlanco, Victor::0000-0003-4308-0381
dc.date.accessioned2023-03-20T09:28:57Z
dc.date.available2023-03-01T03:27:56Z
dc.date.available2023-03-20T09:28:57Z
dc.date.embargo0028-03-14
dc.date.issued2022
dc.description.wosFundingTextThe authors acknowledge support from the ASML-IMEC APC program.
dc.identifier.doi10.1117/1.JMM.21.4.043201
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41210
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpageArt. 043201
dc.source.endpagena
dc.source.issue4
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages17
dc.source.volume21
dc.subject.keywordsNONUNIFORM FILM STRESSES
dc.subject.keywordsMISFIT STRAIN
dc.subject.keywordsINCLUSION
dc.subject.keywordsPLATE
dc.subject.keywordsFIELD
dc.title

Predictive compact model for stress-induced on-product overlay correction

dc.typeJournal article
dspace.entity.typePublication
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