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Pattern roughness mitigation of 22 nm lines and spaces: The impact of H2 plasma treatment
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Pattern roughness mitigation of 22 nm lines and spaces: The impact of H2 plasma treatment
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Date
2015
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30442.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Schepper, Peter
;
Vaglio Pret, Alessandro
;
El Otell, Ziad
;
Hansen, Terje
;
Altamirano Sanchez, Efrain
;
De Gendt, Stefan
Journal
Plasma Processes and Polymers
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1953
since deposited on 2021-10-22
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Acq. date: 2025-12-11
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Metrics
Views
1953
since deposited on 2021-10-22
2
last month
1
last week
Acq. date: 2025-12-11
Citations