Publication:
TSUPREM4 based modeling of boron and carbon diffusion in SiGeC base layers under rapid thermal annealing conditions
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1903 since deposited on 2021-10-15
3last month
Acq. date: 2025-12-15
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Views
1903 since deposited on 2021-10-15
3last month
Acq. date: 2025-12-15
Citations