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A comparative X-ray photoelectron spectroscopy and medium-energy ion-scattering study of ultra-thin, Hf-based high-k films
Publication:
A comparative X-ray photoelectron spectroscopy and medium-energy ion-scattering study of ultra-thin, Hf-based high-k films
Date
2010-03
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Sygellou, L
;
Ladas, S
;
Reading, M.A.
;
van den Berg, J.A.
;
Conard, Thierry
;
De Gendt, Stefan
Journal
Surface and Interface Analysis
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1961
since deposited on 2021-10-18
418
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Acq. date: 2025-10-25
Citations
Metrics
Views
1961
since deposited on 2021-10-18
418
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations