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A comparative X-ray photoelectron spectroscopy and medium-energy ion-scattering study of ultra-thin, Hf-based high-k films

Date

2010-03
Journal article
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dc.contributor.authorSygellou, L
dc.contributor.authorLadas, S
dc.contributor.authorReading, M.A.
dc.contributor.authorvan den Berg, J.A.
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-18T22:08:09Z
dc.date.available2021-10-18T22:08:09Z
dc.date.embargo9999-12-31
dc.date.issued2010-03
dc.identifier.issn0142-2421
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18059
dc.identifier.urlhttp://www3.interscience.wiley.com/cgi-bin/fulltext/123328381/PDFSTART
dc.source.beginpage1057
dc.source.endpage1060
dc.source.issue42
dc.source.journalSurface and Interface Analysis
dc.source.volume2010
dc.title

A comparative X-ray photoelectron spectroscopy and medium-energy ion-scattering study of ultra-thin, Hf-based high-k films

dc.typeJournal article
dspace.entity.typePublication
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