Substrate induced composition change during Ge2/Sb2/Te5 atomic layer deposition and study of initial reactions on SiO2 surface

Publication:

2024

Journal article

Author(s)

;

;

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

338 since deposited on 2024-11-24

5last month

3last week

Acq. date: 2026-08-04