Publication:

15nm HP patterning with EUV lithography and SADP

Date

2012
Meeting abstract
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dc.contributor.authorSouriau, Laurent
dc.contributor.authorHellin, David
dc.contributor.authorKunnen, Eddy
dc.contributor.authorVersluijs, Janko
dc.contributor.authorDekkers, Harold
dc.contributor.authorAlbert, Johan
dc.contributor.authorOrain, Isabelle
dc.contributor.authorYoshie, Kimura
dc.contributor.authorXu, Kaidong
dc.contributor.authorVertommen, Johan
dc.contributor.authorWiaux, Vincent
dc.contributor.authorBoullart, Werner
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.accessioned2021-10-20T16:19:41Z
dc.date.available2021-10-20T16:19:41Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21534
dc.identifier.urlhttp://www.dry-process.org/2012/index.html
dc.source.conference34th International Symposium on Dry Process - DPS
dc.source.conferencedate15/11/2012
dc.source.conferencelocationTokyo Japan
dc.title

15nm HP patterning with EUV lithography and SADP

dc.typeMeeting abstract
dspace.entity.typePublication
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