Publication:

Enhancement of DOF through RET and mask manufacturability in high-NA EUV

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3055034
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dc.contributor.authorHwang, Soobin
dc.contributor.authorGillijns, Werner
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKim, Ryan Ryoung Han
dc.contributor.imecauthorHwang, Soobin
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorKim, Ryoung-Han
dc.contributor.orcidimecHwang, Soobin::0009-0009-9504-1852
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2025-07-31T04:00:02Z
dc.date.available2025-07-31T04:00:02Z
dc.date.issued2025
dc.identifier.doi10.1117/12.3055034
dc.identifier.eisbn978-1-5106-8637-3
dc.identifier.isbn978-1-5106-8636-6
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45985
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage1
dc.source.conference2025 Conference on DTCO and Computational Patterning
dc.source.conferencedate2025-04-22
dc.source.conferencelocationSan Jose
dc.source.endpage9
dc.source.journalProceedings of SPIE
dc.source.numberofpages9
dc.title

Enhancement of DOF through RET and mask manufacturability in high-NA EUV

dc.typeProceedings paper
dspace.entity.typePublication
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