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Applying dipole illumination to characterize the imaging performance of 193nm photoresists for the 100nm node
Publication:
Applying dipole illumination to characterize the imaging performance of 193nm photoresists for the 100nm node
Date
2000
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4929.pdf
398.51 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vleeming, Bert
;
Heskamp, B.
;
Finders, Jo
;
Jaenen, Patrick
Journal
Abstract
Description
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2043
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
2043
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations