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Applying dipole illumination to characterize the imaging performance of 193nm photoresists for the 100nm node

Date

2000
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dc.contributor.authorVleeming, Bert
dc.contributor.authorHeskamp, B.
dc.contributor.authorFinders, Jo
dc.contributor.authorJaenen, Patrick
dc.contributor.imecauthorJaenen, Patrick
dc.date.accessioned2021-10-14T14:16:10Z
dc.date.available2021-10-14T14:16:10Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4924
dc.source.conferenceInterface, Poster Session
dc.source.conferencedate6/11/2000
dc.source.conferencelocationSan Diego, CA USA
dc.title

Applying dipole illumination to characterize the imaging performance of 193nm photoresists for the 100nm node

dc.typeOral presentation
dspace.entity.typePublication
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