Publication:

Chlorine detection and quantification in ALCVD HfO2 high-k dielectric films using total reflection X-ray fluorescence spectrometry

Date

2003
Meeting abstract
Simple item page Full metadata Statistics
 
dc.contributor.authorHellin, David
dc.contributor.authorDelabie, Annelies
dc.contributor.authorPuurunen, Riikka
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVinckier, Chris
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T04:53:23Z
dc.date.available2021-10-15T04:53:23Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7645
dc.source.conference204th Meeting of the Electrochemical Society: 2nd Int. Symp. on High Dielectric Constant Materials
dc.source.conferencedate13/10/2003
dc.source.conferencelocationOrlando, FL USA
dc.title

Chlorine detection and quantification in ALCVD HfO2 high-k dielectric films using total reflection X-ray fluorescence spectrometry

dc.typeMeeting abstract
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions