Publication:

Local mechanical stress induced during Ti- and Co/Ti silicidation reaction in sub-0.25 µm MOS technologies

Date

1998
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dc.contributor.authorSteegen, An
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorBender, Hugo
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.date.accessioned2021-10-01T09:01:00Z
dc.date.available2021-10-01T09:01:00Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2972
dc.source.conferenceWorkshop on Nanoscale Characterization of Silicide/Semiconductor Contacts by Scanning Probe Microscopy; 24 Sept. 1998; Gent, Bel
dc.source.conferencelocation
dc.title

Local mechanical stress induced during Ti- and Co/Ti silicidation reaction in sub-0.25 µm MOS technologies

dc.typeOral presentation
dspace.entity.typePublication
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