Publication:
Low-frequency noise behavior of SiO2-HfO2 dual-layer gate dielectric nMOSFETs with different interfacial oxide thickness
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1925 since deposited on 2021-10-15
Acq. date: 2025-10-23
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Views
1925 since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations