Publication:

Unveiling strain in future generation transistor technology by Bessel beam electron diffraction method

Date

2025-03-17
Journal article
https://doi.org/10.1016/j.mee.2025.112334
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Published version 1.55 MB

Author(s)

Favia, Paola  
;
Eneman, Geert  
;
Nalin Mehta, Ankit  
;
Martinez Alanis, Gerardo Tadeo  
;
Richard, Olivier  
;
Hikavyy, Andriy  
;
Puttarame Gowda, Pallavi  
;
Seidel, Felix  
;
Pourtois, Geoffrey  
;
De Keersgieter, An  
;
Grieten, Eva  

Journal

Microelectronic Engineering

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175 since deposited on 2025-03-18
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Acq. date: 2026-04-05

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